Proximity Exposure System TE2500/TE2535 (Roll to Roll)
Features
- Defects normally cased by dust on musk can be minimized, owing to proximity exposure.
- High-resolution (L/S = 10 µm / 10 µm) on a 260 × 280 or 260 × 350 mm area of rolled substrate can be attained by one-shot exposure.
- Cycle time of 6 seconds can be achieved.
Specifications
| TE2500 | TE2535 | |
|---|---|---|
| Exposure Method | Proximity Exposure | |
| Exposure Area | 260W × 280L [mm] | 260W × 350L [mm] |
| Irradiation Method | Parabolic Mirror | |
| Light Source | 5 kW Super-High Pressure Mercury Lamp(Air Cooling) | |
| Wave Length | 300-520 nm | |
| Irradiance | 55 mW/cm² | 40 mW/cm² |
| Irradiance Uniformity | Within ±5 % | |
| Collimation Angle | Under 1.5 ° | |
| Declination Angle | Under 1.0 ° | |
| Resolution | L/S = 10/10 µm | |
| Alignment Method | Automatic Alignment with Image Processing | |
| Alignment Accuracy | ±5 µm | |
| Film Transfer Accuracy | ±0.1 mm | |
| Cycle Time | 6 sec./cycle (Excluding Exposure Time) | |
| Dimensions | Approx. 4260W × 2100D × 2050H [mm] | |
| Weight | Approx.4,200 [kg] | |
| Utility Requirement | ||
| Power | 3-phase, AC200V, 10kVA | |
| Compressed Air | 0.4 MPa, 50 NL/min | |
| Heat Exhaust | 13 m³/min. | |
Peripheral Equipment
- High-Irradiance Exposure System for PSR (TE2500H/TE2535H)
- Proximity & Hard-contact Exposure System (TE2538)
- Proximity Step Exposure System (TE2000SP)
- Dry Film Laminator
- Roll Coating System (for resist and polyimide varnish)
- Processing Equipment for Pre-treatment, Development, Etching, Stripping, etc.
- Plating System
- External Shape Punching System (with unique image processing for die alignment)
- Screen Printing System (with unique image processing for mask alignment)
- Polyimide Etching System
Related System
- COF / FPC Manufacturing System
- TAB, T-BGA, CSP Manufacturing System
- Lead Frame Manufacturing System
- Suspension (for HDD) Manufacturing System
