Laser Patterning Equipment for Thin-film Multilayer Trimming

Achieving selective processing by lasers to thin films multilayer

Developing a technology to selectively process only the target layer of thin films multilayer at nanometer level by our proprietary optical technology.
We achieve the process to remove only the metal layer or organic film layer without damage to the baselayer, in the field of organic thin-film solar cells, organic EL lighting etc..



Substrate size ~ 600mm
Available to a sheet substrate
Laser wavelength 1064 nm / 532 nm / 355 nm
Takt time Depend on patterning specifications.