April 22, 2020

Paper at "SPIE Advanced Lithography 2020"

We have presented three papers at "SPIE Advanced Lithography 2020" held in San Jose, USA from February 23 (Sun) to February 27 (Thurs).

We have presented 3papers at "SPIE Advanced Lithography 2020".

・Massive metrology of 2D logic patterns on BEOL EUVL
・Realizing more accurate OPC models by utilizing SEM contours
・Contour extraction algorithm for edge placement error measurement using machine learning

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