2005-5-31

Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die — Geometry Verification System NGR2100 for DFM

• Event: Photomask Japnan 2005
• Tadashi Kitamura*, Kazufumi Kubota*, Toshiaki Hasebe*, Futoshi Sakai*,Shinichi Nakazawa*, Neeti Vohra*, Masahiro Yamamoto*, Masahiro Inoue**
  
  *NGR Inc., 7F NK Shimurasakaue Bldg., 3-6-7 Azusawa, Itabashi-ku, Tokyo Japan 174-0051
  **Topcon Corp., 75-1,Hasunuma-cho,Itabashi-ku,Tokyo, Japan 174-8580

ABSTRACT

The Geometry Verification System NGR2100 enables verification of the entire die, on a resist or an after-etch wafer, by comparing images of a die with corresponding target CAD data. The system detects systematic defects by variable criteria setting for allowable deformation quantities and obtains a CD distribution diagram. The result of systematic defects can then be used to make root cause analysis. The CD distribution diagram can achieve stepper aberration analysis, process windows extraction, macro-loading effect analysis, FEM measurement, and trend analysis more efficiently. Consequently, the Geometry Verification System NGR2100 will contribute to quicker TAT for DFM in Design, Lithography and Mask production.

Key words: entire die, image, geometry, target CAD data, verification, DFM