2006-2-26

A template infrastructure for step-and-flash imprint lithography The templates needed for 1× step-and-flash imprint lithography can be fabricated using extensions of current optical mask manufacturing technology

ABSTRACT

Over the last 30 years, many different varieties of next generation lithography (NGL) have been proposed as successors to optical lithography, but the continued extension of that technology – combined with the lack of a commercial NGL mask infrastructure – made it extremely difficult for any NGL to penetrate the silicon market. How will imprint lithography avoid sharing the fate of the others?