2024-11-12

高加速SEMのシースルーBSE画像における高度な下層パターン輪郭抽出機能開発

• Event: 第44回ナノテスティングシンポジウム(NANOTS2024)
• 大家政洋, 岡本陽介, 中澤伸一, 丸山浩太郎, 山崎裕一郎, 御堂義博, 三浦典之
  
  第44回ナノテスティングシンポジウム(NANOTS2024), pp.24–28, Nov. 2024.

ABSTRACT

Backscattered electron (BSE) image of high voltage SEM contains upper- and lower-layer patterns of semiconductor device sample. Sharpness and contrast of lower layer pattern are low due to the diffusion of incident electrons when passing through the upper layer pattern. To extract pattern contour precisely, new method based on active contour model is applied to contour extraction of lower layer pattern. By comparing measurement results of reproducibility and precision from conventional and new methods, advantages of new method are reported.

Key words: High voltage, EBI, SEM, D2DB, CD, EPE, Overlay, CVNet